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INVESTIGATION OF THE STABILITY OF IMPEDANCE MATCHING PROCESS FOR RF ORIGINATED PLASMA. ՌԱԴԻՈՀԱՃԱԽԱՅԻՆ ՊԼԱԶՄԱՅԻ ԻՄՊԵԴԱՆՍԻ ՀԱՄԱՁԱՅՆԵՑՄԱՆ ՊՐՈՑԵՍԻ ԿԱՅՈՒՆՈՒԹՅԱՆ ՈՒՍՈՒՄՆԱՍԻՐՈՒՄԸ: ИССЛЕДОВАНИЕ СТАБИЛЬНОСТИ ПРОЦЕССА СОГЛАСОВАНИЯ РАДИОЧАСТОТНОЙ ПЛАЗМЫ

Sargsyan, Sargis T. (2019) INVESTIGATION OF THE STABILITY OF IMPEDANCE MATCHING PROCESS FOR RF ORIGINATED PLASMA. ՌԱԴԻՈՀԱՃԱԽԱՅԻՆ ՊԼԱԶՄԱՅԻ ԻՄՊԵԴԱՆՍԻ ՀԱՄԱՁԱՅՆԵՑՄԱՆ ՊՐՈՑԵՍԻ ԿԱՅՈՒՆՈՒԹՅԱՆ ՈՒՍՈՒՄՆԱՍԻՐՈՒՄԸ: ИССЛЕДОВАНИЕ СТАБИЛЬНОСТИ ПРОЦЕССА СОГЛАСОВАНИЯ РАДИОЧАСТОТНОЙ ПЛАЗМЫ. PhD thesis, Institute of Radiophysics and Electronics, Armenian National Academy of Sciences.

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      Abstract

      1. Electrical impedance features of RF plasma have been Investigated. In a plasma reactor with capacitive coupling, an interrelation between the features of the optical spectrum and the plasma’s RF feeding power has been established. 2. In a plasma reactor with capacitive coupling, RF plasma impedance dependence on the power of the RF generator and the gas pressure in the reactor is established as well as the hysteresis nature of the plasma impedance from the supply generator power is investigated. The causes of discharges in RF plasma have been investigated. It is proposed to use impedance to detect discharge in a plasma. 3. The equipment for dual-channel plasma impedance measurement has been designed and embedded in manufacturing of semiconductor devices. The designed equipment allows simultaneous monitoring of the impedance behavior in different cross-sections of feeder and different harmonics up to the 7th harmonic relative to the main one. 4. An adaptive plasma impedance matching algorithm has been developed, and the stability of the matching process has been investigated. It is advised to carry out impedance matching of RF generator and plasma not immediately, but according to the method of gradual approaches instead. That way the probability of plasma discharge is reduced.

      Item Type: Thesis (PhD)
      Subjects: Physics > 07.Instruments, apparatus, components common to several branches of physics
      Physics > 50.Physics of gases, plasmas, and electric discharges
      Divisions: UNSPECIFIED
      Depositing User: Admin .
      Date Deposited: 02 May 2020 18:09
      Last Modified: 09 May 2020 09:07
      URI: http://irphe.asj-oa.am/id/eprint/96

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